The University of Southampton

Low temperature hot-wire silicon waveguides

Nanophotonics and Biomimetics

The project concerns the fabrication of low optical loss polysilicon waveguides deposited using Hot-Wire Chemical Vapour Deposition (HWCVD) at a temperature of 240C. A polysilicon film of 220 nm thick was deposited on top of a 2000 nm thick PECVD silicon dioxide. The crystalline volume fraction of the polysilicon film was measured by Raman spectroscopy to be 91%. The optical propagation losses of 400, 500, and 600 nm waveguides were measured to be 16.9, 15.9, and 13.5 dB/cm, respectively, for transverse electric (TE) mode at the wavelength of 1550 nm.

Primary investigator

  • Harold M. H. Chong

Secondary investigators

  • T M B Masaud
  • A Tarazona
  • Graham T Reed
  • Goran Z Mashanovich

Associated research groups

  • Nano Research Group
  • Optoelectronics Research Centre
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