The new facility has significant advantages: it is interdisciplinary and efficient, significantly shortening device and circuit turn-around times. Although based on Silicon fabrication technology and largely using Silicon substrates, the new clean room is not aligned with a core Silicon process, such as Bipolar technology or CMOS technology. Instead, the deep-submicron capability afforded by equipment such as the JEOL direct-write electron beam lithography system means that we will concentrate primarily on structuring, modifying and characterizing materials at the nanoscale.
These materials will include Silicon, but will also enable polymers and more exotic materials such as Zinc Oxide, high-refractive index metallic oxides, and lithium niobate to be nanostructured. By studying the practical solutions to structural and optical problems provided by Nature (biomimetics), we will create a new generation of unique nanodevices, which will satisfy the ever-increasing needs of society.
The building contains:
We have the capability to fabricate
Essential equipment for the building includes: