Module Overview

This course consists of two parts: 'Nanofabrication' deals with the fabrication of structures that are smaller than 100 nm, while 'Microscopy' concerns the visualization of such small features. Advanced optical lithography concepts are illustrated by a computer simulation lab with the industry-standard software "GenISys LAB".

We start with a general overview of nanotechnology, explaining why the properties of materials are so different at the nanoscale compared to the microscale. The difference between top-down and bottom-up fabrication is explained and the ultimate industrial nanofabrication process (CMOS) is outlined, including the technological issues related to further scaling according to Moore's Law.

After introducing general microscopy concepts such as magnification, resolution, depth of field and contrast, it is discussed how image formation is achieved in optical microscopy. Many of the principles of optical microscopy also apply to the next topic. Optical lithography is crucial for top-down nanofabrication (and CMOS scaling) because it defines the smallest feature size that can be fabricated. The historical development of optical lithography is presented, up to the present state-of-the-art and looking forward to future developments of this patterning technique.

We then switch back to the microscopies: transmission electron microscopy, scanning electron microscopy and scanning helium ion microscopy all enable visualization of nanoscale structures but image formation, resolution, contrast mechanism and sample preparation are quite different. The images of MOSFET cross-sections will be explained. These particle beam techniques are also used in fabrication: e-beam writing is a serial lithography that enables ~10 nm patterns, while focused ion beam milling has numerous applications in nanofabrication.

The microscopy characterisation part concludes with the scanning probe microscopies, scanning tunneling microscopy and atomic force microscopy, which have driven the development of nanotechnology and are perhaps best known for the stunning 2.5D images of carbon nanotubes. Once again, the technique can also be applied to nanofabrication, for example as dip-pen nanolithography, which enables the positioning of (catalyst) material with nanometer resolution.

We finish the nanofabrication component with a brief description of bottom-up processes such as the chemical synthesis of carbon nanotubes, silicon nanowires and gold nanoparticles. This is put in the context of fabricating nanoelectronic devices by a mix of top-down and bottom-up fabrication processes. For example, carbon nanotubes can be grown inbetween micro-electrodes by patterning these with a catalyst material. Similar examples from the recent literature will be highlighted.

The computer lab sessions involve simulations of photoresist exposure for different optical lithography techniques and explores various resolution enhancement methods that enable nanometer scale patterning in general and advanced CMOS scaling in particular. As part of the lab you will design your own photomask. The GenISys LAB lithography simulation software is used in commercial nanofabrication facilities and is only available for this module because of a special agreement with the company.

Please note that ELEC6206 Nanofabrication and Microscopy (see the Notes directory for info slides) does not deal with fabrication techniques that are essentially the same as for microfabrication. Etching, deposition and process flow are explained in detail in ELEC6201 Microfabrication, and this module is a prerequisite for ELEC6206 Nanofabrication and Microscopy.

Module Overview

Modern biology poses many challenging problems for the computer scientists. Rapid growth in instrumentation, and our ability to archive and distribute vast amounts of data, has significantly changed the way we attempt to understand cellular function, and the way we seek to treat complex diseases. Data from biology comes in various forms: nucleotide and amino-acid sequences, macromolecular structures, measurements from high-throughput experiments and curated literature in the form of publications and functional annotations. It is nowadays widely acknowledged that computational modelling will play a key role in extracting useful information from vast amounts of such diverse types of data. The computational challenges faced by the human genome project and Alan Turing’s contribution to morphogenesis are classic examples of such roles.

The aim of this module is to develop an understanding of some of the computational challenges that form the basis of research in modern biology, skills associated with which are seen as important in biomedical informatics and pharmaceutical industries. You will get hands-on experience in formulating computational problems and analysing large and complex datasets to make model-based predictions about the underlying biological problems. 

Module Overview

This module will provide an introduction to the theory and practice of bio-nanotechnology, and introduce students to working in a cleanroom and a wet laboratory.

ELEC6205 includes a bionanotechnology experiment involving state-of-the-art equipment that is normally only used by researchers. The experiment starts with fabrication and characterisation of a microstructured master mold, and continues with casting of an elastomeric stamp and printing microscale patterns of biological molecules. This will take place partly in the Mountbatten clean room and partly in the bio-ECS lab (Centre for Hybrid Biodevices) in the Life Sciences building.

This module is a prerequisite for ELEC6210 Biosensors, except for students that already took ELEC3223 in Part 3. ELEC6205 cannot be taken by students who took ELEC3223 in Part 3.

Module Overview

This module teaches the basics of the behaviour of fluids in microsystems, specifically focussing on the interaction of fundamental physical mechanisms and the design of microfluidic devices.  It also reviews and analyses the state of the art in applied microfluidics such as Laboratory-on-a-Chip technology

Module Overview

The student will gain a basic understanding of current MicroElectroMechanical Systems (MEMS) technology and industrial instrumentation systems, with particular emphasis on smart sensors and actuators. The course introduces the fundamental of measurement systems and focuses in particular on MEMS fabrication, MEMS transducer types and applications. This is a core module for the MSc MEMS course and is optional for MSc Bionanotechnology, MSc Nanoelectronics and Nanotechnology, and Pt 4 MEng Electronics and Electromechanical courses.

Module Overview

The aim of this module to provide an overview of advancement of memory and storage devices in line with the development of nanoelectronics and nanotechnology. Students will gain knowledge of how silicon device scaling has moved semiconductor memory into the nanoelectronics area. Then they will become familiar with state-of-the-art non-volatile memory technologies which are intended to replace or complement semiconductor memory.  Longer term data storage in the form of high density portable devices such as hard disks and Blu Rays will be discussed as well. 

Module Overview

This module provides an overview of modern microfabrication technologies, and is as such structured around the state-of-the-art facilities in the new Southampton Nanofabrication Centre. The various fabrication techniques that are relevant for microdevices in the field of electronics, optoelectronics and micro-electro-mechanical-systems (MEMS) will be addressed in the lectures, with an emphasis on their physical and chemical principles. The integration of these techniques will be explained with an example of a complete process flow for the fabrication of a specific microdevice. The organization of a fabrication facility, including risk assessment aspects, will be addressed with a cleanroom tour and laboratory-based coursework. This laboratory will take place in the clean room.

Module Overview

The design of an artefact is a complex sociotechnical problem. The module is designed to extend the students’ knowledge of the design process beyond normally expected of a graduate engineer (as defined by the accreditation process).  The module in part will take a Design Thinking approach, which considers the cognitive processes involved in design.

While the technical problems are widely understood, a holistic view of the design process includes considerations of problems of how does the design team capture the design rationale, what are the risks associated with the design relative to the costs of mitigation, how is the IPR in the additive manufacturing process.

In taking the module student will gain an in depth understanding of  design processes and how the sociotechnical issues will impact on the pure technical challenges.

Module Overview

To cover in some depth those areas of circuitry likely to be used between an analogue signal source and a digital signal processing system, making maximum use of available integrated circuits.

This fits in with our overall programme of providing a broad based electronics engineering course, with this module covering the main aspects of measuring outputs from a variety of sensors, designing interface circuits and amplifiers, filtering, and data conversion.

The course will also cover important topics such as clock generation, noise management, power supply design, as well as practical issues such as packaging, EMC and PCB design.

It is assumed that the students at least understand the basics of opamp circuits, and basic analogue to digital conversion principles as for example covered in part 1 ELEC1207 and part 2 ELEC2216 Advanced Electronic Systems.

Module Overview

This module builds on the first year Data Management module by examining the construction of database management systems, and the data structures and algorithmic techniques used to represent and manipulate data effectively.